Veeco, TurboDisc EPIK 700 MOCVD 시스템을 출시하여 고체 조명 적용 가속화

Veeco Instruments Inc. (Nasdaq:VECO) introduced today the new TurboDisc® EPIK 700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) system that combines the industry’s highest productivity and best-in-class yields with low cost of operation, further enabling lower manufacturing costs for light emitting diodes (LEDs) for general lighting applications.

Veeco, TurboDisc EPIK 700 MOCVD 시스템을 출시하여 고체 조명 적용 가속화

Product News | Sep 04, 2014

PLAINVIEW, N.Y.–(BUSINESS WIRE)– Veeco Instruments Inc. (Nasdaq:VECO) introduced today the new TurboDisc® EPIK 700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) system that combines the industry’s highest productivity and best-in-class yields with low cost of operation, further enabling lower manufacturing costs for light emitting diodes (LEDs) for general lighting applications.

Veeco introduces TurboDisc EPIK700 GaN MOCVD System for high volume LED manufacturing to accelerate ... Veeco introduces TurboDisc EPIK 700 GaN MOCVD System for high volume LED manufacturing to accelerate general lighting adoption. (Photo: Business Wire)

Based on Veeco’s proven TurboDisc technology, the EPIK 700 MOCVD system enables customers to achieve a cost per wafer savings of up to 20 percent compared to previous generations through improved wafer uniformity, reduced operating expenses, and increased productivity. The EPIK 700 system features a reactor with more than twice the capacity of current generation reactors. This increased volume, combined with productivity advancements within the reactor, results in a 2.5x throughput advantage over previous generation MOCVD systems.

“The EPIK 700 is our latest in a distinguished line of technologically advanced MOCVD reactors,” said William J. Miller , Ph.D., Executive Vice President, Veeco. “We are pleased to say that one of the world’s top LED manufacturers has thoroughly evaluated and accepted the EPIK 700 due to its production worthiness, stable process and reproducible results. We anticipate that this new product will help our customers further succeed in the solid-state lighting market, by driving down LED manufacturing costs and increasing productivity.”

Since the introduction of the TurboDisc K465i GaN MOCVD System in 2010, Veeco has steadily improved its customers’ cost of ownership and became the world’s leading MOCVD equipment supplier. In 2011, Veeco launched the industry’s first multi-reactor MOCVD system, the award-winning TurboDisc MaxBright® MOCVD System. In addition, Veeco’s MOCVD TurboDisc technology has been recognized as best in the industry by LED trade associations in each year from 2011 to 2013.

“The EPIK 700 is another game-changer for the LED industry,” said Jim Jenson , Senior Vice President and General Manager, Veeco MOCVD. “In addition to higher capacity and throughput, the system contains proprietary technologies within the reactor that improve wavelength uniformity and drive higher yields in a tighter bin. By combining the advanced TurboDisc reactor design with excellent uniformity, higher productivity, proven automation, low consumable costs and improved footprint efficiency, we have significantly improved the cost per wafer for our customers.”

According to a recent IHS Research report, LED unit penetration is expected to reach 15 percent in such key markets as China, Japan, North America and Europe by 2016 and more than double to 40 percent by 2020.

About TurboDisc EPIK 700 GaN MOCVD SYSTEM

Veeco’s new breakthrough EPIK 700 MOCVD system is the LED industry’s highest productivity MOCVD system that reduces cost per wafer by up to 20 percent compared to previous generations. Available in one-and two-reactor configurations, EPIK 700 features breakthrough technologies including the new IsoFlange™ center injection flow and TruHeat™ wafer coil that provide homogeneous laminar flow and uniform temperature profile across the entire wafer carrier. 이러한 기술적 혁신은 파장 균일성을 가능하게 하여 더 좁은 빈에서 좋은 수율을 얻을 수 있습니다. EPIK 700은 자체적으로 큰 리액터 크기 덕분에 기타 시스템에 비해 2.5x throughput 이점이 있습니다. 대량 생산을 위해 설계된 EPIK 700은 31×4”, 12×6” 및 6×8” 웨이퍼 캐리어 크기를 사용할 수 있습니다. 고객은 쉽게 기존 TurboDisc 시스템에서 새로운 EPIK 700 MOCVD 플랫폼으로 공정을 이송하여 고품질 LED를 빠르게 생산할 수 있습니다. 이 정상급 시스템은 융통성 있는 EPIK 700 MOCVD 플랫폼을 통해 향후 업그레이드, 추가 이점 및 향상된 기능을 제공하여 기타 시스템과 차별성을 지닙니다.

Veeco 소개

Veeco’s process equipment solutions enable the manufacture of LEDs, flexible OLED displays, solar cells, power electronics, hard drives, MEMS and wireless chips. We are the market leader in LED, MBE, Ion Beam and other advanced thin film process technologies. Veeco의 고성능 시스템은 에너지 효율, 가전제품 및 네트워크 저장의 혁신을 주도하며 이를 통해 고객 여러분의 생산성 극대화 및 소유 비용 절감을 달성할 수 있습니다. For information on our company, products and worldwide service and support, please visit www.veeco.com.

To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management’s Discussion and Analysis sections of Veeco’s Annual Report on Form 10-K for the year ended December 31, 2013 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases.Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.

Source: Veeco Instruments Inc.

Veeco Instruments Inc.Investors:Debra Wasser, 516-677-0200 x1472

dwasser@veeco.com

or

Media:

Jeffrey Pina, 516-677-0200 x1222

jpina@veeco.com

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