5G, 포토닉스 및 CMOS용 Propel 300mm GaN MOCVD(유기 금속 화학 증착) 시스템

완전 자동화된 단일 웨이퍼 클러스터 시스템으로 300mm substrate에서 생산용 5G RF, 포토닉스 및 고급 CMOS 장치 제조 가능.

The Propel™ 300mm fully automated single wafer cluster system is the only industry proven GaN MOCVD tool that enables production of 5G RF, Photonic and advanced CMOS devices on 300mm substrates.

Featuring a single-wafer reactor platform, the Propel 300mm system is capable of producing best-in-class, high quality epitaxy films on 300mm wafers with exceptional uniformity, repeatability and yield. The Propel 300mm System is configurable with up to 3 modular cluster chambers and offers automated cassette to cassette handling for maximum flexibility and productivity.

The single-wafer reactor is based on Veeco’s leading TurboDisc® design including the IsoFlange™ and SymmHeat™ technologies that provide laminar flow and uniform temperature profile across the entire wafer. Customers can easily transfer processes from the Veeco single wafer reactor Propel and Propel HVM systems to the Propel 300mm GaN MOCVD system for fast development to production.

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