물 분해

물의 광산화

원자층 증착(ALD: Atomic Layer Deposition) 기술을 사용하여 웨이퍼 분할 응용 작업을 위한 높은 표면적 구조를 생성할 수 있습니다. 물 광산화(물 분할)를 위해 고표면적 전도 및 투명 프레임워크의 제조가 개발되었습니다.

Savannah® S200을 사용하는 원자층 증착(ALD: Atomic Layer Deposition) 필름을 역 오팔 구조물에서 ITO(in.Tin. Oxide) 및 Fe2O3에 대한 노출 모드 기술을 사용하여 증착하여, 높은 표면적 나노구조를 생성하였습니다.

Fe2O3에서 Ti 치환을 통한 그린라이트 물 산화

Ti 합금은 초박(6nm 두께) 적철석 변환 효율, 특히 녹색 광자에 의해 생성된 홀 수집 효율(500 – 600nm)을 개선하기 위해 사용되었습니다. Savannah® S200은 이 연구에서 TiO2 및 Fe2O3의 막을 증착하는 데 사용되었습니다.

참고 자료 – Veeco CNT 원자층 증착(ALD: Atomic Layer Deposition) 플랫폼에서 최근 발표된 출판물

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